Our PVD plant enables us to vaporize metals (e.g. Al, Cr, Ti) and oxides (e.g. Al2O3, MgO, SiOX) and deposit these on web-shaped substrates. These thin functional layers have a thickness in the nano-range (less than 100 nm) and are applied to films ad paper.
Utilize our vacuum coating plants to improve the properties of your flexible materials such as their barrier properties, conductivity, optical appearance, and mechanical stability. The small film width of 280 mm minimizes the use of materials.
For optimizing the layer design of multilayer films we possess state-of-the-art plants for not only vacuum coating but also for lacquering, lamination, and extrusion. We can optimize the process steps individually and also in combination.
Vacuum coating using electron beam vaporization enables us to coat web-shaped substrates with nanolayers of various metals and oxides. With oxides (e.g. silicon oxide) transparent barriers are obtained. In combination with special lacquers for barrier applications this allows the customization of property profiles, for example for flexible photovoltaic systems, LED applications, paper-based printable electronics, and (translucent) vacuum panels. The suitability and quality of the lacquers can be tested using our lacquering and laimanting plants.